Máy phân tích khối tứ cực HORIBA Quadrupole Mass Analyzer Micropole System QL Series
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HORIBA Quadrupole Mass Analyzer Micropole System QL Series
The MICROPOLE system is one of the smallest mass spectrometer systems making it easy to install. The system is proven to be an ideal solution for many chamber characterization applications. The compact size is achieved by the patented design of miniature array of quadrupole mass filters. The system is capable of operating at much higher pressures than traditional systems, so the need for additional differential pumping equipment is reduced.
FEATURES
- Extremely compact size and lightweight
1/20th size when compared to conventional residual gas analyzers making it easy to integrate to any system - High performance
Mini array of 9 quadrupoles gives excellent sensitivity at a fraction of the volume of traditional quadrupoles - High pressure operation
Can be used at up to 0.9Pa (7mTorr, 9 x 10-3mbar) resulting in the reduction or elimination of expensive vacuum pumping for many applications - Interchangeable sensor head in calibration
The sensor heads are pre-tuned and calibrated prior to shipment allowing the user to make sensor changes in the field without the need for fine tuning or technical expertise - Network sensors
Up to eight sensors can be monitored by a single PC using RS-485. PC-less scan operation by external I/O is also possible. - User friendly software
Micropole Scanner™ 2 software allows the user to monitor partial pressures of gases in various modes e.g. trend graph, spectrum graph, bar graph.
Measurement principle
The quadrupole mass analyzer consists of an ion source, a mass ion detector. The residual gas is ionized when it collides with the thermoelectrons discharged from the high-temperature filament, and the ions that are thereby created accelerate and converge onto the mass filter. At the mass filter, varying direct current and RF is applied to the electrodes (quadropoles), which allows the ions to be separated by mass. The separated ions are detected as electric current by the Faraday cup. The ion current is proportional to the partial pressure of the residual gas.
MICROPOLETM Analyzer
The feature that makes the quadrupole mass analyzer unique is the MICROPOLETM Analyzer (MPA); a grouping of nine quadropoles that takes full advantage of ultraprecision optical etching processing technology and glass/metal joint technology. The development of the MPA has enabled the creation of the quadrupole mass analyzer, world’s smallest residual gas analyzer, while offering the same or better sensitivity as conventional, larger mass spectrometers. The analyzer is a plug-in unit. It features a sensor unit that has already been calibrated for partial pressure and offers absolute total and partial pressure measurement.
Applications
Chamber condition monitoring
The Microople System QL Series has been used for measuring residual gases for a long time due to its compactness. In the metal sputtering process, it is necessary to reduce the partial pressure of oxygen-based gases in order to avoid oxidation of sputtered metals. Once a chamber is exposed to air for maintenance, it takes time to reduce residual gases and the quadrupole mass analyzer is suitable to check the chamber condition.
Plasma process monitoring
The quadrupole mass analyzer has one of the in-situ process monitoring techniques for plasma processes including etching, sputtering and dry cleaning. In the deposition process of transparent conductive oxide films by reactive sputtering, the control of oxygen-based gases is critical for both transparency and conductivity. Recent complexity of semiconductor processes require additional process monitoring tools for shortening equipment ramp-up time and detecting process abnormalities.
SPECIFICATIONS
External Dimensions (mm)
Specifications
Micropole System
Spectrum Generator
| Model | QL-SG02-065-1A | QL-SG02-100-1A | QL-SG02-300-1A |
| Mass Range | m/z 2-65 | m/z 2-100 | m/z 4-300 |
| Mass Filter Type | Qadrupole | ||
| Detector | Faraday cup | ||
| Measurement Scan Speed | 50 – 6400 ms/m/z | ||
| Ionization Voltage | 43eV or 70eV selectable | ||
| Operating Temperature | 15 – 45°C | ||
| Operating Humidity | 80%RH or less (not condensing) | ||
| Storage Temperature | 0 – 80°C | ||
| Weight (with Special Clamp for SMPA Type Sensor) | 575g | ||
| Demension | W150 x H62 x D747 (mm) | ||
| RS485 communication baud rate | 115.2K / 38.4K / 9.6Kbps | ||
| Analog I/O interface | Input: 0-10V 2ch, Output: 0-10V 4ch | ||
| Contact I/O | Tool status 3ch, Control signal input 3ch, Set point output 5ch | ||
| Power input | DC 24V +/-5%, 100mVpp, 50W | ||
| Connector type | Round type connector: PRC03-23A10-4M | ||
* The below sensor specifications are based on a scanning speed of 400ms m/z unit.
* Windows 10 and higher based configuration and data acquisition software is included.
Sensor
| Model | MPA8-7-2/65C | MPA8-5-2/100C | SMPA8-1-2/100CR | MPA8-1-4/300C |
| Measured Upper Limit Pressue (N2)*1 | 0.5Pa | 0.2Pa | 0.1Pa | 0.2Pa |
| Maximum Operating Pressure (N2)*2 | 0.9Pa | 0.6Pa | 0.1Pa | 0.4Pa |
| Minimum Detectable Partial Pressure (N2) | 5.0×10-6Pa (70eV) | |||
| Resolution (FWHM: N2) | 1.2±0.3 m/z units | 1.0±0.3 m/z units | 1.5±0.3 m/z units | 1.8±0.3 m/z units |
| Maximum Bake out Temperature ( SG removed ) | 350°C | |||
| Maximum Operating Temperature ( SG installed ) | 150°C | |||
| Mounting Flange | ISO-KF16 (NW 16), CF34 (ICF 34) | |||
| Weight | MPA:CF34 Flange 50g | SMPA:ISO-KF16 Flange 50g | MPA:CF34 Flange 50g | |
| Filament | Y2O3/Ir 2pcs | 3%Re/W 2pcs | Y2O3/Ir 2pcs | |
| RoHS | Compliance | |||
* SMPA type sensor is protected by a mesh on the vacuum fitting, designed to extend the lifetime of sensor in harsh environment such as plasma processes.
*1 A pressure at which the Q-mass signal output is saturated. Beyond this pressure, signal outputs may not correspond to actual pressures.
*2 An upper limit pressure that can be operated. If an operating pressure exceed the limit one, the measurement may stop to protect the sensor.
